Company Profile
DSI, Inc. was founded in April 1995, is a diversified customer-driven company
that offers semiconductor process equipment, including vertical and horizontal
furnace systems, to a worldwide semiconductor industry.
With the know-how gained from the vertical furnace systems, the Company designs,
manufactures, and markets environmentally controlled (oxygen, moisture, particle)
processing systems that are used in Diffusion, Oxidation, Annealing and LPCVD
processing equipment.
DSI's vertical furnace systems features fast heat-up & air-forced cool-down
with small heat capacity furnace, and Double-wall structure in order to keep
very low oxygen concentration (less than 1 PPM) before, during and after the wafer
process, to eliminate contamination. Another feature is very simple and stable batch
wafer loading system, which transfers the wafer within a few minutes.
In addition, over the past year, DSI has provided technical service to the industry
for installation and refurbishing of used equipment and systems at customer site.
We have also started to provide an automated product, the IBAL, including the
cantilever and process product, ATMOSCAN, as an exclusive sales agent of
Amtech/Tempress Systems in USA in the Horizontal Diffusion Furnace Market.
DSI focus wider area of heat treatment equipment, maintains engineering;
sales and maintenance network to fully support the requirements of both the
vertical and horizontal furnace customers in the marketplace as follows:
Wafer size: 50mm to 0ver 300mm
Application: Si devices, GaAs, GaN, MEMS, MRAM, SiC devices,
Metal annealing, High Vacuum process,
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